Experiment A and B - Initial Replication

 Cell:

• Cathode:  3.5 cm of exposed 0.25mm Ag wire as close as possible to 1 cm x 2 cm Landauer CR-39 chip.
• Anode:  Approximately 20 cm of 0.3mm Pt wire  
• A:  with magnets
• B:  without magnets

 Electrolyte:

• 33 gm D2O + 0.42 gm LiCl + 0.176 gm PdCl2 (for one cell)

 Procedure:

• 0.28 mA for 8 hours (1 mA/cm^2)
• 0.83 mA for 8 hours (3 mA/cm^2)
• added magnets to cell A (we received the official TGP protocol at this time)
• 1.37 mA until clear – 12 days (5 mA/cm^2)
• 5 mA for 24 hours
• 10 mA for 24 hours
• 25 mA for 24 hours
• 50 mA for 24 hours
• 100 mA for 48 hours

Etch:

•  all photos taken at 2 hours into the etch in 6.5M NaOH at 68°C

Results (Started on 12.5.06 Ended on 12.24.06): 

• Cell A had about 200 gauss at cathode location, B had 20 gauss at cathode location
• Cell walls were damaged during run
• Chips appeared unaltered and clear until the removal of the cathode.  Underneath the cathode, there was a distinct, cloudy line
• After etching, the cloudy line under the cathode was noticeably raised
• 790 microns at the thinnest point in the bulk material (A)
• 870 microns at the thickest point on the ridge (A)  

                (Experiment B shown for clarity – no magnets)  

Damage to the cell walls:

100x	200x	400x

CR-39:

Post etch: "A" (magnets)	Post etch: "B" (no magnets)
40x 100x 200x 400x	40x 100x 200x 400x

Post etch photomicrographs of unusual features
A: 400x Abrupt "edge"
A: 400x Blank line - possibly from Ag wire contact
A:  100x Damage - mechanical?  chemical?
A: 200x Same damage
A: 400x Same damage
A: 400x Another area with similar damage (much more localized)
B: 200x "The line" - it can also be seen on the 40x photo of B above
B: 200x Dead zone - possibly from Ag wire
B: 400x Abrupt "edge"
B: 400x "Tracks" well away from cathode - and about half the size